Experimental Analysis of Within-Die Process Variation in 65...

Experimental Analysis of Within-Die Process Variation in 65 and 180 nm Complementary Metal–Oxide–Semiconductor Technology Including Its Distance Dependences

Ansari, Tania, Imafuku, Wataru, Yasuda, Masahiro, Mattausch, Hans Jürgen, Koide, Tetsushi
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
51
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.51.04DE03
Date:
April, 2012
File:
PDF, 1013 KB
english, 2012
Conversion to is in progress
Conversion to is failed