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[Widerkehr & Associates 1996 Symposium on VLSI Technology. Digest of Technical Papers - Honolulu, HI, USA (11-13 June 1996)] 1996 Symposium on VLSI Technology. Digest of Technical Papers - 25 Å gate oxide without boron penetration for 0.25 and 0.3-μm PMOSFETs
Liu, C.T., Ma, Y., Cheung, K.P., Chang, C.P., Fritzinger, L., Becerro, J., Luftman, H., Vaidya, H.M., Colonell, J.I., Kamgar, A., Minor, J.F., Murray, R.G., Lai, W.Y.C., Pai, C.S., Hillenius, S.J.Year:
1996
Language:
english
DOI:
10.1109/VLSIT.1996.507777
File:
PDF, 213 KB
english, 1996