[IEEE 2011 11th Annual Non-Volatile Memory Technology Symposium (NVMTS) - Shanghai, China (2011.11.7-2011.11.9)] 2011 11th Annual Non-Volatile Memory Technology Symposium Proceeding - Composition control of GexSbyTez film for PCRAM application by chemical vapor deposition
Horiike, Takafumi, Hamada, Seiti, Uno, Tomohiro, Machida, Hideaki, Ishikawa, Masato, Sudo, Hiroshi, Ohshita, Yoshio, Ogura, AtsushiYear:
2011
Language:
english
DOI:
10.1109/NVMTS.2011.6137082
File:
PDF, 574 KB
english, 2011