[IEEE 2009 IEEE International Reliability Physics Symposium...

  • Main
  • [IEEE 2009 IEEE International...

[IEEE 2009 IEEE International Reliability Physics Symposium - Montreal, QC, Canada (2009.04.26-2009.04.30)] 2009 IEEE International Reliability Physics Symposium - Degradation of interface integrity between a high-k dielectric thin film and a gate electrode due to excess oxygen in the film

Miura, Hideo, Suzuki, Ken, Ito, Yuta, Samukawa, Seiji, Kubota, Tomonori, Ikoma, Toru, Yoshikawa, Hideki, Ueda, Shigenori, Yamashita, Yoshiyuki, Kobayashi, Keisuke
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Year:
2009
Language:
english
DOI:
10.1109/IRPS.2009.5173282
File:
PDF, 1.03 MB
english, 2009
Conversion to is in progress
Conversion to is failed