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[IEEE 2009 IEEE International Reliability Physics Symposium - Montreal, QC, Canada (2009.04.26-2009.04.30)] 2009 IEEE International Reliability Physics Symposium - Degradation of interface integrity between a high-k dielectric thin film and a gate electrode due to excess oxygen in the film
Miura, Hideo, Suzuki, Ken, Ito, Yuta, Samukawa, Seiji, Kubota, Tomonori, Ikoma, Toru, Yoshikawa, Hideki, Ueda, Shigenori, Yamashita, Yoshiyuki, Kobayashi, KeisukeYear:
2009
Language:
english
DOI:
10.1109/IRPS.2009.5173282
File:
PDF, 1.03 MB
english, 2009