[Ultra Clean Soc ISSM2000. Ninth International Symposium on Semiconductor Manufacturing - Tokyo, Japan (26-28 Sept. 2000)] Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130) - High reliability interconnect technology with tungsten-barrier metal in next generation
Shohji, R.Year:
2000
Language:
english
DOI:
10.1109/ISSM.2000.993640
File:
PDF, 515 KB
english, 2000