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[IEEE 2013 14th International Conference on Ultimate Integration on Silicon (ULIS 2013) - Coventry (2013.3.19-2013.3.21)] 2013 14th International Conference on Ultimate Integration on Silicon (ULIS) - Self-aligned double patterning of 1× nm FinFETs; A new device integration through the challenging geometry
Kim, M.-S, Vandeweyer, T., Altamirano-Sanchez, E., Dekkers, H., Van Besien, E., Tsvetanova, D., Richard, O., Chew, S., Boccardi, G., Horiguchi, N.Year:
2013
Language:
english
DOI:
10.1109/ULIS.2013.6523501
File:
PDF, 1.22 MB
english, 2013