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[IEEE 2013 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK) - Suita, Japan (2013.06.5-2013.06.6)] 2013 IEEE International Meeting for Future of Electron Devices, Kansai - Evaluation of TaOx nanoparitcles for resistive random access memory
Kado, Keisuke, Ban, Takahiko, Uenuma, Mutsunori, Ishikawa, Yasuaki, Yamashita, Ichiro, Uraoka, YukiharuYear:
2013
Language:
english
DOI:
10.1109/IMFEDK.2013.6602273
File:
PDF, 1.47 MB
english, 2013