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Excitation mechanism and thermal emission quenching of Tb ions in silicon rich silicon oxide thin films grown by plasma-enhanced chemical vapour deposition—Do we need silicon nanoclusters?
Podhorodecki, A., Golacki, L. W., Zatryb, G., Misiewicz, J., Wang, J., Jadwisienczak, W., Fedus, K., Wojcik, J., Wilson, P. R. J., Mascher, P.Volume:
115
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4871015
Date:
April, 2014
File:
PDF, 2.07 MB
english, 2014