Reply to “Comment on '308 nm Photolysis of Nitric Acid in...

Journal of Physical Chemistry A 2012 / 10 Vol. 116; Iss. 42

Reply to “Comment on '308 nm Photolysis of Nitric Acid in the Gas Phase, on Aluminum Surfaces, and on Ice Films'”

Zhu, Chengzhu, Xiang, Bin, Chu, Liang T., Zhu, Lei
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Volume:
116
Language:
english
Journal:
The Journal of Physical Chemistry A
DOI:
10.1021/jp307455q
Date:
October, 2012
File:
PDF, 142 KB
english, 2012
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