Low-temperature chemical vapor deposition of ruthenium...

Chemistry of Materials 1993 / 07 Vol. 5; Iss. 7

Low-temperature chemical vapor deposition of ruthenium dioxide from ruthenium tetroxide: a simple approach to high-purity RuO2 films

Yuan, Zheng, Puddephatt, Richard J., Sayer, Michael
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
5
Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/cm00031a004
Date:
July, 1993
File:
PDF, 1.46 MB
english, 1993
Conversion to is in progress
Conversion to is failed