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Electrical and structural properties of indium tin oxide films deposited by reactive DC sputtering
Rottmann, M, Heckner, K -HVolume:
28
Language:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/0022-3727/28/7/024
Date:
July, 1995
File:
PDF, 525 KB
english, 1995