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Atomic Interdiffusion and Diffusive Stabilization of Cobalt by Copper During Atomic Layer Deposition from Bis( N - tert -butyl- N ′-ethylpropionamidinato) Cobalt(II)
Elko-Hansen, Tyler D.-M., Dolocan, Andrei, Ekerdt, John G.Volume:
5
Language:
english
Journal:
The Journal of Physical Chemistry Letters
DOI:
10.1021/jz500281k
Date:
April, 2014
File:
PDF, 3.46 MB
english, 2014