Quantitative Calculation of Oxygen Incorporation in...

Quantitative Calculation of Oxygen Incorporation in Sputtered IGZO Films and the Impact on Transistor Properties

Kwon, Seyeoul, Noh, Joo Hyon, Noh, Jiyong, Rack, Philip D.
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Volume:
158
Year:
2011
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.3530779
File:
PDF, 481 KB
english, 2011
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