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Stacked FRAM capacitor etching process for high density application
Joo, S. H., Lee, J. J., Lee, K. M., Nam, S. D., Lee, S. W., Oh, S. J., Lee, Y. T., Park, S. O., Kang, H. K., Moon, J. T.Volume:
37
Language:
english
Journal:
Integrated Ferroelectrics
DOI:
10.1080/10584580108015670
Date:
January, 2001
File:
PDF, 497 KB
english, 2001