Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
1985 Vol. 3; Iss. 3
Plasma etching of organic materials. I. Polyimide in O2–CF4
Egitto, F. D.Volume:
3
Year:
1985
Language:
english
DOI:
10.1116/1.583078
File:
PDF, 962 KB
english, 1985