Atomic Layer Deposition on Phase-Shift Lithography...

ACS Applied Materials & Interfaces 2010 / 12 Vol. 2; Iss. 12

Atomic Layer Deposition on Phase-Shift Lithography Generated Photoresist Patterns for 1D Nanochannel Fabrication

Güder, Firat, Yang, Yang, Krüger, Michael, Stevens, Gregory B., Zacharias, Margit
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Volume:
2
Language:
english
Journal:
ACS Applied Materials & Interfaces
DOI:
10.1021/am100592f
Date:
December, 2010
File:
PDF, 2.09 MB
english, 2010
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