Plasmon-Assisted Chemical Vapor Deposition

Nano Letters 2006 / 11 Vol. 6; Iss. 11

Plasmon-Assisted Chemical Vapor Deposition

Boyd, David A., Greengard, Leslie, Brongersma, Mark, El-Naggar, Mohamed Y., Goodwin, David G.
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Volume:
6
Language:
english
Journal:
Nano Letters
DOI:
10.1021/nl062061m
Date:
November, 2006
File:
PDF, 590 KB
english, 2006
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