Charge Density and pH Effects on Polycation Adsorption on Poly-Si, SiO 2 , and Si 3 N 4 Films and Impact on Removal During Chemical Mechanical Polishing
Penta, Naresh K., Veera, P. R. Dandu, Babu, S. V.Volume:
3
Language:
english
Journal:
ACS Applied Materials & Interfaces
DOI:
10.1021/am2010114
Date:
October, 2011
File:
PDF, 1.72 MB
english, 2011