A Simulation Study on the Effect of Cross-Linking Agent Concentration for Defect Tolerant Demolding in UV Nanoimprint Lithography
Amirsadeghi, Alborz, Lee, Jae Jong, Park, SunggookVolume:
28
Language:
english
Journal:
Langmuir
DOI:
10.1021/la300256k
Date:
August, 2012
File:
PDF, 1.13 MB
english, 2012