Relief and Functional Photoimaging with Chemically...

Chemistry of Materials 1995 / 05 Vol. 7; Iss. 5

Relief and Functional Photoimaging with Chemically Amplified Resists Based on Di-tert-Butyl Butenedioate-co-Styrene

Zhang, Chunhao, Vekselman, Alexander M., Darling, Graham D.
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Volume:
7
Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/cm00053a006
Date:
May, 1995
File:
PDF, 1.64 MB
english, 1995
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