Plasma-Deposited Fluorocarbon Films: Insulation Material...

Analytical Chemistry 2008 / 07 Vol. 80; Iss. 13

Plasma-Deposited Fluorocarbon Films: Insulation Material for Microelectrodes and Combined Atomic Force Microscopy−Scanning Electrochemical Microscopy Probes

Wiedemair, Justyna, Balu, Balamurali, Moon, Jong-Seok, Hess, Dennis W., Mizaikoff, Boris, Kranz, Christine
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Volume:
80
Language:
english
Journal:
Analytical Chemistry
DOI:
10.1021/ac800246q
Date:
July, 2008
File:
PDF, 841 KB
english, 2008
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