Influence of processing route and SiO2 on sintering...

Journal of Materials Research 2008 / 9 Vol. 23; Iss. 9

Influence of processing route and SiO2 on sintering ability, CTE, and dielectric constant of β-Si4Al2O2N6

Ganesh, Ibram, Thiyagarajan, N., Jana, D.C., Sundararajan, G., Olhero, S.M., Ferreira, J.M.F.
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Volume:
23
Language:
english
Journal:
Journal of Materials Research
DOI:
10.1557/jmr.2008.0302
Date:
September, 2008
File:
PDF, 366 KB
english, 2008
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