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Comparison of Materials for the Ferroelectric Thin Film to be Integrated into High Density FeRAMs
BRUCHHAUS, R., MOON, B.-K., HILLIGER, A., NAGEL, N., YAMADA, Y., ITOKAWA, H., YAMAKAWA, K., KUNISHIMA, I., BEITEL, G.Volume:
64
Language:
english
Journal:
Integrated Ferroelectrics
DOI:
10.1080/10584580490894113
Date:
January, 2004
File:
PDF, 288 KB
english, 2004