[IEEE 2008 17th IEEE International Symposium on the Applications of Ferroelectrics (ISAF) - Santa Re, NM, USA (2008.02.23-2008.02.28)] 2008 17th IEEE International Symposium on the Applications of Ferroelectrics - Reliability characterization of a Ferroelectric Random Access Memory embedded within 130nm CMOS
Rodriguez, J. A., Remack, K. A., Gertas, J., Boku, K., Udayakumar, K. R., Summerfelt, S.R., Shinn, G., Haider, A., Madan, S., McAdams, H., Moise, T. S., Bailey, R., Eliason, J., Depner, M., Kim, D., SYear:
2008
Language:
english
DOI:
10.1109/isaf.2008.4693960
File:
PDF, 239 KB
english, 2008