Patterning of Self-Assembled Films Using Lithographic...

Japanese Journal of Applied Physics 1993 / 12 Vol. 32; Iss. Part 1, No

Patterning of Self-Assembled Films Using Lithographic Exposure Tools

Dressick, Walter J., Calvert, Jeffrey M.
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Volume:
32
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.32.5829
Date:
December, 1993
File:
PDF, 4.36 MB
1993
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