Comparative Study of Atomic-Layer-Deposited Stacked (HfO...

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ACS Applied Materials & Interfaces 2013 / 05

Comparative Study of Atomic-Layer-Deposited Stacked (HfO 2 /Al 2 O 3 ) and Nanolaminated (HfAlO x ) Dielectrics on In 0.53 Ga 0.47 As

Mahata, Chandreswar, Byun, Young-Chul, An, Chee-Hong, Choi, Sungho, An, Youngseo, Kim, Hyoungsub
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Language:
english
Journal:
ACS Applied Materials & Interfaces
DOI:
10.1021/am400368x
Date:
May, 2013
File:
PDF, 3.50 MB
english, 2013
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