![](/img/cover-not-exists.png)
Highly Stable Silyl Radicals (Et n Me 3- n Si) 3 Si • ( n = 1−3)
Kyushin, Soichiro, Sakurai, Haruaki, Betsuyaku, Takashi, Matsumoto, HideyukiVolume:
16
Language:
english
Journal:
Organometallics
DOI:
10.1021/om970607x
Date:
December, 1997
File:
PDF, 176 KB
english, 1997