Precise Thermal Characterization of Confined Nanocrystalline Silicon by a 3ω Method
Kihara, Takashi, Harada, Toshihiro, Koshida, NobuyoshiVolume:
44
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.44.4084
Date:
June, 2005
File:
PDF, 204 KB
english, 2005