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Polydiacetylene Monolayers as Versatile Photoresists for Interfacial Patterning
Mowery, Mark D., Smith, Amethyst Cook, Evans, Christine E.Volume:
16
Language:
english
Journal:
Langmuir
DOI:
10.1021/la000178z
Date:
July, 2000
File:
PDF, 550 KB
english, 2000