Effect of Catalyst Layer Density and Growth Temperature in Rapid Atomic Layer Deposition of Silica Using Tris( tert -pentoxy)silanol
Won, Seok-Jun, Kim, Joon Rae, Suh, Sungin, Lee, Nae-In, Hwang, Cheol Seong, Kim, Hyeong JoonVolume:
3
Language:
english
Journal:
ACS Applied Materials & Interfaces
DOI:
10.1021/am200176j
Date:
May, 2011
File:
PDF, 1.02 MB
english, 2011