Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
2011 Vol. 29; Iss. 6
Metrology development for extreme ultraviolet lithography: Flare and out-of-band qualification
Lorusso, G. F., Hendrickx, E., Davydova, N., Peng, Y., Eurlings, M., Feenstra, K., Jiang, J.Volume:
29
Year:
2011
Language:
english
DOI:
10.1116/1.3660385
File:
PDF, 842 KB
english, 2011