Low Temperature Deposition of Silicon Nitride by the...

Japanese Journal of Applied Physics 1989 / 10 Vol. 28; Iss. Part 1, No

Low Temperature Deposition of Silicon Nitride by the Catalytic Chemical Vapor Deposition Method

Matsumura, Hideki
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Volume:
28
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.28.2157
Date:
October, 1989
File:
PDF, 1.01 MB
1989
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