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Thermodynamic calculations and kinetic verifications on the chemical vapor deposition process of Si–C–N ceramic from the SiCl3CH3–NH3–H2–Ar precursors
Liu, Yongsheng, Liu, Xiaofei, Ye, Fang, Zhang, Litong, Cheng, Laifei, Yin, XiaoweiVolume:
40
Language:
english
Journal:
Ceramics International
DOI:
10.1016/j.ceramint.2014.07.110
Date:
December, 2014
File:
PDF, 5.38 MB
english, 2014