[IEEE 31st European Solid-State Device Research Conference - Nuremberg, Germany (2001.9.11-2001.9.13)] 31st European Solid-State Device Research Conference - Arsenic and Phosphorus co-Implantation for Deep Submicron CMOS Gate and Source/Drain Engineering
Augendre, E., De Keersgieter, A., Kubicek, S., Redolfi, A., Van Laer, J., Badenes, G.Year:
2001
Language:
english
DOI:
10.1109/essderc.2001.195214
File:
PDF, 122 KB
english, 2001