Positive-Tone Photoresist Process for Supercritical Carbon...

Chemistry of Materials 2003 / 12 Vol. 15; Iss. 26

Positive-Tone Photoresist Process for Supercritical Carbon Dioxide Development

Pham, Victor Q., Ferris, Robert J., Hamad, Alyssandrea, Ober, Christopher K.
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Volume:
15
Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/cm034343i
Date:
December, 2003
File:
PDF, 97 KB
english, 2003
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