Application of Polysilanes to LSI Manufacturing...

Chemistry of Materials 2001 / 06 Vol. 13; Iss. 6

Application of Polysilanes to LSI Manufacturing ProcessesTheir Antireflective Properties and Etching Selectivity toward Resists

Hayase, S., Nakano, Y., Ohta, H., Sato, Y., Shiobara, E., Miyoshi, S., Onishi, Y., Abe, M., Matsuyama, H., Ohiwa, Y.
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Volume:
13
Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/cm010099o
Date:
June, 2001
File:
PDF, 177 KB
english, 2001
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