Actinic detection of sub-100 nm defects on extreme...

Actinic detection of sub-100 nm defects on extreme ultraviolet lithography mask blanks

Jeong, Seongtae, Johnson, Lewis, Rekawa, Seno, Walton, Chris C., Prisbrey, Shon T., Tejnil, Edita, Underwood, James H., Bokor, Jeffrey
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Volume:
17
Year:
1999
Language:
english
DOI:
10.1116/1.590944
File:
PDF, 453 KB
english, 1999
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