Formation, Characterization, and Sub-50-nm Patterning of Organosilane Monolayers with Embedded Disulfide Bonds: An Engineered Self-Assembled Monolayer Resist for Electron-Beam Lithography
Wang, Xuejun, Hu, Wenchuang, Ramasubramaniam, Rajagopal, Bernstein, Gary H., Snider, Gregory, Lieberman, MaryaVolume:
19
Language:
english
Journal:
Langmuir
DOI:
10.1021/la035291e
Date:
November, 2003
File:
PDF, 988 KB
english, 2003