Chlorination−Methylation of the Hydrogen-Terminated Silicon(111) Surface Can Induce a Stacking Fault in the Presence of Etch Pits
Solares, Santiago D., Yu, Hongbin, Webb, Lauren J., Lewis, Nathan S., Heath, James R., Goddard, William A.Volume:
128
Language:
english
Journal:
Journal of the American Chemical Society
DOI:
10.1021/ja055408g
Date:
March, 2006
File:
PDF, 58 KB
english, 2006