Copper CVD Precursors Containing Alkyl 3-Oxobutanoate...

Chemistry of Materials 1996 / 01 Vol. 8; Iss. 5

Copper CVD Precursors Containing Alkyl 3-Oxobutanoate Ligands

Hwang, Soontaik, Choi, Hyungsoo, Shim, Ilwun
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Volume:
8
Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/cm950436r
Date:
January, 1996
File:
PDF, 155 KB
english, 1996
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