Effect of oxygen gas pressure on the kinetics of alumina film growth during the oxidation of Al(111) at room temperature
Cai, Na, Zhou, Guangwen, Müller, Kathrin, Starr, David E.Volume:
84
Language:
english
Journal:
Physical Review B
DOI:
10.1103/physrevb.84.125445
Date:
September, 2011
File:
PDF, 503 KB
english, 2011