Coulomb and Phonon Scattering Processes in...

Coulomb and Phonon Scattering Processes in Metal–Oxide–Semiconductor Inversion Layers: Beyond Matthiessen's Rule

Ishihara, Takamitsu, Sano, Nobuyuki
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Volume:
44
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.44.1682
Date:
April, 2005
File:
PDF, 176 KB
english, 2005
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