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Remote Phonon Scattering in Si and Ge with SiO 2 and HfO 2 Insulators: Does the Electron Mobility Determine Short Channel Performance?
O'Regan, Terrance, Fischetti, MassimoVolume:
46
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.46.3265
Date:
May, 2007
File:
PDF, 188 KB
english, 2007