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[IEEE 2006 International Workshop on Junction Technology - Shanghai, China ()] 2006 International Workshop on Junction Technology - Precision Implant Requirements for SDE Junction Formation in sub-65 nm CMOS Devices
Erokhin, Y., Jinning Liu,Year:
2006
Language:
english
DOI:
10.1109/iwjt.2006.220852
File:
PDF, 3.99 MB
english, 2006