Atomic Layer Deposition of Metal Tellurides and Selenides Using Alkylsilyl Compounds of Tellurium and Selenium
Pore, Viljami, Hatanpää, Timo, Ritala, Mikko, Leskelä, MarkkuVolume:
131
Language:
english
Journal:
Journal of the American Chemical Society
DOI:
10.1021/ja8090388
Date:
March, 2009
File:
PDF, 397 KB
english, 2009