Inductively Coupled Pulsed Plasmas in the Presence of...

IEEE Transactions on Plasma Science 2009 / 09 Vol. 37; Iss. 9

Inductively Coupled Pulsed Plasmas in the Presence of Synchronous Pulsed Substrate Bias for Robust, Reliable, and Fine Conductor Etching

Banna, S., Agarwal, A., Tokashiki, K., Hong Cho,, Rauf, S., Todorow, V., Ramaswamy, K., Collins, K., Stout, P., Jeong-Yun Lee,, Junho Yoon,, Kyoungsub Shin,, Sang-Jun Choi,, Han-Soo Cho,, Hyun-J
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Volume:
37
Language:
english
Journal:
IEEE Transactions on Plasma Science
DOI:
10.1109/tps.2009.2028071
Date:
September, 2009
File:
PDF, 2.61 MB
english, 2009
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