Etching of CoFeB Using CO∕NH[sub 3] in an Inductively Coupled Plasma Etching System
Park, Jong-Yoon, Kang, Se-Koo, Jeon, Min-Hwan, Jhon, Myung S., Yeom, Geun-YoungVolume:
158
Year:
2011
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.3505295
File:
PDF, 456 KB
english, 2011