![](/img/cover-not-exists.png)
(Invited) Stress Simulations of Si- and Ge-Channel FinFETs for the 14 nm-Node and Beyond
Eneman, G., Brunco, D. P., Witters, L., Vincent, B., Favia, P., Hikavyy, A., De Keersgieter, A., Mitard, J., Loo, R., Veloso, A., Richard, O., Bender, H., Vandervorst, W., Caymax, M., Horiguchi, N., CVolume:
53
Language:
english
Journal:
ECS Transactions
DOI:
10.1149/05301.0225ecst
Date:
May, 2013
File:
PDF, 344 KB
english, 2013