Molybdenum Atomic Layer Deposition Using MoF...

Chemistry of Materials 2011 / 04 Vol. 23; Iss. 7

Molybdenum Atomic Layer Deposition Using MoF 6 and Si 2 H 6 as the Reactants

Seghete, D., Rayner, G.B., Cavanagh, A.S., Anderson, V.R., George, S.M.
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Volume:
23
Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/cm101673u
Date:
April, 2011
File:
PDF, 1.06 MB
english, 2011
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