Microlithographic Assessment of a Novel Family of...

Chemistry of Materials 2001 / 11 Vol. 13; Iss. 11

Microlithographic Assessment of a Novel Family of Transparent and Etch-Resistant Chemically Amplified 193-nm Resists Based on Cyclopolymers

Klopp, John M., Pasini, Dario, Byers, Jeffrey D., Willson, C. Grant, Fréchet, Jean M. J.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
13
Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/cm010431w
Date:
November, 2001
File:
PDF, 332 KB
english, 2001
Conversion to is in progress
Conversion to is failed